Lawrence Berkeley National Laboratory

ANGEL

Accelerating the Next-Generation of EUV Lithography

The ANGEL project is part of the Extreme Lithography & Materials Innovation Center (ELMIC), a Microelectronics Science Research Center (MSRC) funded by the U.S. Department of Energy.

ANGEL investigates methods for controlling the radiation transport properties of laser-produced plasma to improve the efficiency and power of EUV sources, and to reveal and control the atomic-scale processes of mirror degradation by EUV plasma ejecta and secondary hydrogen plasma.

Diagram of laser-produced plasma radiation transport and EUV multilayer mirror degradation by plasma ejecta and hydrogen plasma
Laser-produced plasma radiation transport and mirror degradation by EUV plasma ejecta and secondary hydrogen plasma.

ANGEL Team