Resonant Soft X-Ray Scattering (RSoXS)
RSoXS combines the chemical sensitivity of near-edge X-ray absorption spectroscopy (NEXAFS) with the structural information of small-angle scattering to probe nanoscale morphology in soft matter, polymers, and organic electronic materials. By tuning the photon energy to absorption edges of constituent elements, RSoXS provides contrast between chemically distinct domains that would be invisible to conventional SAXS.
Critical-Dimension RSoXS/R for EUV Resist Metrology
We develop critical-dimension resonant soft X-ray scattering and reflectivity (RSoXS/R) metrology to probe the chemical profiles of latent images stored in resist after exposure and post-exposure bake. For the science this enables, see the Soft X-ray Science research page.
Instrument Details
| Energy Range | 250–1000 eV (carbon, nitrogen, oxygen K-edges; transition metal L-edges) |
| q Range | 0.003–1 Ź (length scales ~5–2000 nm) |
| Detector | In-vacuum CCD for 2D scattering patterns |
| Sample Environment | Transmission geometry; temperature stage; in situ capabilities |
| Beamline | ALS beamline 11.0.1.2 |
Applications
Organic Photovoltaics
RSoXS reveals the donor-acceptor morphology in bulk heterojunction solar cells, correlating nanoscale phase separation with device performance.
Block Copolymer Self-Assembly
Chemical contrast at the carbon K-edge enables characterization of microphase-separated block copolymer thin films used in directed self-assembly (DSA) lithography.
Battery & Energy Materials
Resonant scattering at transition metal L-edges probes compositional heterogeneity and domain structures in electrode materials.
Biological & Environmental
Carbon and nitrogen edge contrast allows study of protein aggregation, biopolymer assemblies, and organic-inorganic composite materials.
Related Research
RSoXS complements Microelectronics and EUV Lithography Science research programs.
