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Binary pseudo-random array standard for extreme ultraviolet lithography tool characterization

Benk, M.P., Yamada, K., Chao, W.L., Lacey, I., Yashchuk, V., Fontaine, B.L., Takacs, P., Rochester, S., & Munechika, K.

Optical Engineering, 65(01), (2026)

Bismuth-oxo Clusters for Next Generation Extreme Ultraviolet Light Photolithography

MacKenzie, H.K., LaPierre, E.A., Zhang, Q., Kostko, O., Young, H.K.S., & Manners, I.

Chemistry of Materials, 37(22), 9116-9123, (2025)

Demonstration of a dual-beam zone plate for phase-contrast coherent soft x-ray imaging

He, W., Islegen-Wojdyla, A., Ditter, A., Basak, R., Chao, W., Burdet, N., Chong, X., Gu, C., Frañó, A., Roy, S., Schöll, A., Шапиро, Д.А., & Goldberg, K.A.

25, (2025)

Direct measurement of reduced exchange stiffness and its impact on magnetic vortex behavior in PyGd alloys

Jacob, L., Han, H., Im, M., & Pollard, S.

Applied Physics Letters, 126(16), (2025)

Effect of Networking Density on the Patterning Performance of Molecular Layer Deposited Alucone Electron Beam/EUV Resists

Than, L.V., D’Acunto, G., Harake, M., Im, H., Kostko, O., & Bent, S.F.

ACS Applied Materials & Interfaces, 17(40), 56477-56490, (2025)

Enhanced EUV mask imaging using Fourier ptychographic microscopy

Gu, C., Islegen-Wojdyla, A., Benk, M.P., Goldberg, K.A., & Waller, L.

40, (2025)

Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography Using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition

Waltz, K.E., Zhou, X., Krull, X., Singh, S., Mattson, E.C., Miao, Y., Hettermann, M., Grodt, T., Zhang, Q., Im, H., Lüttgenau, B., Doyle, L., Kraetz, A., Beutner, M., Clendenning, S.B., Fairbrother, D.H., Hupp, J.T., Naulleau, P., Rooney, L.W., Kostko, O., et al.

Chemistry of Materials, 37(21), 8548-8567, (2025)

Extreme Ultraviolet and Beyond Extreme Ultraviolet Lithography using Amorphous Zeolitic Imidazolate Resists Deposited by Atomic/Molecular Layer Deposition

Waltz, K.E., Zhou, X., Krull, X., Singh, S., Mattson, E.C., Miao, Y., Hettermann, M., Grodt, T., Zhang, Q., Im, H., Lüttgenau, B., Doyle, L., Kraetz, A., Beutner, M., Clendenning, S.B., Fairbrother, D.H., Hupp, J.T., Naulleau, P., Rooney, L.W., Kostko, O., et al.

(2025)

Fabrication and characterization of a full-size ultra-precise lamellar grating for the Cosmic beamline at ALS-U

Voronov, D.L., Park, S., Huang, L., Islegen-Wojdyla, A., Gullikson, E.M., Padmore, H.A., Wang, T., & Idir, M.

Journal of Synchrotron Radiation, 32(5), 1194-1200, (2025)

Full-size lamellar grating for the cosmic beamline at ALS-U

Park, S., Gullikson, E.M., Voronov, D.L., & Padmore, H.A.

29, (2025)

High precision monitoring of outgassing species in model EUV photoresists with a cavity ring-down spectrometer

Lüttgenau, B., Arata, C., Im, H., Mueller, M., Oh, D., Kostko, O., McHale, L., Rella, C.W., Hoffnagle, J.A., & Houle, F.A.

62, (2025)

High-precision monitoring of outgassing species in model extreme ultraviolet photoresists with a cavity ring-down spectrometer

Lüttgenau, B., Arata, C., Im, H., Mueller, M., Oh, D., Kostko, O., McHale, L., Rella, C.W., Hoffnagle, J.A., & Houle, F.A.

Journal of Micro/Nanopatterning Materials and Metrology, 24(03), (2025)

Hybrid chemical characterization of latent images in EUV resist with 12 nm half-pitch features

O’Reilly, P., Yu, B., Holcomb, W., Sumitro, A., Ruiz, R., Fontaine, B.L., Wang, C., McQuade, L., Bhattacharya, M., Castellanos, S., Park, S., & Zhang, Q.

Journal of Micro/Nanopatterning Materials and Metrology, 24(02), (2025)

Initial Stage of Nanoscale Imaging in Positive Tone Extreme UV Photoresists: The Influence of the Polymer Sequence

Houle, F.A., Hinsberg, W.D., Milton, J., Zhang, Q., Wang, C., & Blau, S.M.

ACS Applied Polymer Materials, 8(1), 361-369, (2025)

Initial stage of nanoscale imaging in positive-tone extreme UV photoresists: the influence of polymer sequence

Houle, F.A., Hinsberg, W.D., Milton, J., Zhang, Q., Wang, C., & Blau, S.M.

(2025)

Mask-side Hyper-NA EUV imaging on the SHARP microscope

Benk, M.P., Miyakawa, R., Chao, W., & Fontaine, B.L.

Journal of Micro/Nanopatterning Materials and Metrology, 24(01), (2025)

Multimodal correlative study of Hall transport and magnetic phases in Fe/Gd multilayer systems

Saleheen, A.U., Singh, A., Raftrey, D., Brozius, M.A., McCarter, M.R., Tumbleson, R., Im, M., Montoya, S., Fullerton, E.E., Fischer, P., Kevan, S.D., Roy, S., & Morley, S.A.

Applied Physics Letters, 126(14), (2025)

Navigating the research landscape for hyper-NA EUV lithography and future patterning technologies

Fontaine, B.L., Rekawa, S., Miyakawa, R., Holcomb, W., Benk, M.P., Kostko, O., Wang, C., Zhang, Q., Gullikson, E.M., Chao, W., Im, M., Zaytsev, D., Houle, F.A., Helms, B.A., Nealey, P.F., Ober, C.K., & Ruiz, R.

48, (2025)

Photoselective isotope fractionation dynamics of N ₂ with cosmo and atmospheric chemistry perspectives

Komarova, K., Gelfand, N., Remacle, F., Levine, R.D., Chakraborty, S., Jackson, T.L., Kostko, O., & Thiemens, M.H.

Proceedings of the National Academy of Sciences, 122(29), e2511172122, (2025)

Publisher Correction: Spin-on deposition of amorphous zeolitic imidazolate framework films for lithography applications

Miao, Y., Zheng, S., Waltz, K.E., Ahmad, M., Zhou, X., Zhou, Y., Wang, H., Boscoboinik, J.A., Liu, Q., Agrawal, K.V., Kostko, O., Zhuang, L., & Tsapatsis, M.

Nature Chemical Engineering, (2025)

Sensitive dependence on initial conditions in a formation of magnetic vortices

Jeong, S., Kang, M., Jung, D., Yu, Y., Im, M., Han, H., & Lee, K.

Applied Physics Letters, 127(4), (2025)

Spin-on deposition of amorphous zeolitic imidazolate framework films for lithography applications

Miao, Y., Zheng, S., Waltz, K.E., Ahmad, M., Zhou, X., Zhou, Y., Wang, H., Boscoboinik, J.A., Liu, Q., Agrawal, K.V., Kostko, O., Zhuang, L., & Tsapatsis, M.

Nature Chemical Engineering, 2(9), 594-607, (2025)

Sustaining EUV materials innovation: source upgrade and status update from the Berkeley MET5

Miyakawa, R., Holcomb, W., Zaytsev, D., Rekawa, S., & LaFontaine, B.

34, (2025)

Synergistic Alignment of Low Aspect‐Ratio π‐Conjugated Molecules Enables Exceptional UV–vis–NIR Polarization Detection

Xue, Y., Zuo, Q., Zhu, Q., Li, Y., Deng, Z., Zhang, Z., Yang, Z., Wang, C., Zhang, R., Liu, X., Zhong, J., Zhong, W., Ying, L., & Cai, W.

Laser & Photonics Review, 20(1), (2025)

Terrace‐Edge‐Induced Domain Nucleation in Room‐Temperature 2D Magnetic Van Der Waals Heterostructures

Lee, J., Gu, J., Kim, W.G., Lee, J., Chao, W., Lee, K., Qiu, Z.Q., Im, M., & Han, H.

Advanced Functional Materials, (2025)

The DOE E3SM version 2.1: overview and assessment of the impacts of parameterized ocean submesoscales

Smith, K., Barthel, A., Conlon, L.M., Roekel, L.V., Bartoletti, A., Golaz, J., Zhang, C., Begeman, C., Benedict, J.J., Bisht, G., Feng, Y., Hannah, W.M., Harrop, B.E., Jeffery, N., Lin, W., Ma, P., Maltrud, M., Petersen, M., Singh, B., Tang, Q., et al.

Geoscientific model development, 18(5), 1613-1633, (2025)

Topological excitonic insulator with tunable momentum order

Hossain, M.S., Cheng, Z., Jiang, Y., Cochran, T.A., Zhang, S., Wu, H., Liu, X., Zheng, X., Cheng, G., Kim, B., Zhang, Q., Litskevich, M., Zhang, J., Liu, J., Yin, J., Yáng, X., Denlinger, J.D., Tallarida, M., Dai, J., Vescovo, E., et al.

Nature Physics, 21(8), 1250-1259, (2025)

Understanding the role of underlayers in enhancing EUV resist sensitivity

Im, H., McAfee, T., Zhang, Q., Naulleau, P., Fontaine, B.L., & Kostko, O.

41, (2025)

A Three‐in‐One Hybrid Strategy for High‐Performance Semiconducting Polymers Processed from Anisole

Liu, C., Liang, H., Xie, R., Zhou, Q., Qi, M., Yang, C., Gu, X., Wang, Y., Zhang, G., Li, J., Gong, X., Chen, J., Zhang, L., Zhang, Z., Ge, X., Wang, Y., Chen, Y., Liu, Y., & Liu, X.

Advanced Science, 11(25), e2401345, (2024)

A Vacuum Ultraviolet Photoionization Mass Spectrometry and Density Functional Calculation Study of Formic Acid–Water Clusters

Daniely, A., Wannenmacher, A., Levy, N., Sheffer, O., Joseph, E., Kostko, O., Ahmed, M., & Stein, T.

The Journal of Physical Chemistry A, 128(31), 6392-6401, (2024)

Advanced processes in metal-oxide resists for high-NA EUV lithography

Dinh, C.Q., Nagahara, S., Cho, K., Tomori, H., Kuwahara, Y., Onitsuka, T., Okada, S., Kawakami, S., Hara, A., Fujimoto, S., Muramatsu, M., Tsuzuki, R., Liu, X., Thiam, A., Feurprier, Y., Nafus, K., Carcasi, M., Huli, L., Kato, K., Krawicz, A., et al.

4, (2024)

Anthropogenic Extremely Low Volatility Organics (ELVOCs) Govern the Growth of Molecular Clusters Over the Southern Great Plains During the Springtime

Shrivastava, M., Zhang, J., Zaveri, R.A., Zhao, B., Pierce, J.R., O’Donnell, S.E., Fast, J.D., Gaudet, B., Shilling, J.E., Zelenyuk, A., Murphy, B.N., Pye, H.O.T., Zhang, Q., Trousdell, J., & Zhang, R.

Journal of Geophysical Research Atmospheres, 129(21), e2024JD041212, (2024)

Are sodiation/de-sodiation reactions reversible in two-dimensional metallic NbSe₂?

Liu, Z., Wang, R., Zhang, P., Dun, C., Urban, J.J., Yang, S., Wang, T., Ma, Y., Zhong, Y., He, J., Zhu, Z., Xiong, X., Fan, W., Zhou, Q., Yang, H., Cheng, X., Wang, F., Huang, Y., & Wu, Y.

Energy & Environmental Science, 17(6), 2173-2181, (2024)

Atomic dynamics of electrified solid–liquid interfaces in liquid-cell TEM

Zhang, Q., Song, Z., Sun, X., Liu, Y., Wan, J., Betzler, S.B., Zheng, Q., Shangguan, J., Bustillo, K.C., Ercius, P., Narang, P., Huang, Y., & Zheng, H.

Nature, 630(8017), 643-647, (2024)

Binary pseudo-random array for calibration of interferometers with transmission spheres and cylinders

Munechika, K., Rochester, S., Chao, W., Lacey, I., Piña-Hernandez, C., Yamada, K., Biskach, M.P., Takacs, P.Z., Griesmann, U., & Yashchuk, V.V.

4, (2024)

Binary pseudo-random array standards for calibration of 3D optical surface profilers used for metrology with significantly curved x-ray optics

Munechika, K., Yamada, K., Rochester, S., Barnard, H., Chao, W., Lacey, I., Piña-Hernandez, C., Takacs, P.Z., & Yashchuk, V.V.

13, (2024)

Characterization of chemical/structural information of latent image via critical-dimension resonant soft x-ray scattering

Zhang, Q., Chao, W., Holcomb, W., Miyakawa, R., Kumar, D., Ruiz, R., Neureuther, A.R., Naulleau, P., & Wang, C.

9, (2024)

Characterization of latent image of electron beam resist via critical-dimension resonant soft X-ray scattering

Zhang, Q., Andrle, A., Chao, W., Peng, Z., Holcomb, W., Miyakawa, R., Kumar, D., Hexemer, A., Naulleau, P., Fontaine, B.L., Ruiz, R., & Wang, C.

Journal of Micro/Nanopatterning Materials and Metrology, 23(04), (2024)

Control of a twisted domain wall motion supported by topology

Kim, S.T., Han, H., Im, M., & Je, S.

Journal of Applied Physics, 135(10), (2024)

Development of a narrowband multilayer mirror for extracting a single order component from high harmonics in the 63–70  eV region

Liu, S.Y., Iwamoto, Y., Mashiko, H., Ichimaru, S., Hatayama, M., Gullikson, E.M., Mizuno, T., Kurihara, T., Itatani, J., & Takenaka, H.

Applied Optics, 63(17), 4522, (2024)