"We manufacture custom nanostructures for a diverse set of applications worldwide. Our experienced team of scientists and engineers is here to push the limits of nanofabrication and help you realize the unique goals of your project. Our flexible environment and ability to tap into other resources at Berkeley Lab enable us to address applications ranging from semiconductors and magnetics to optics and nano-mechanics."
Nanowriter Principal Scientist
Diffraction gratings (below)
Zone plates (below)
The Nanowriter (below) supports a broad array of scientific instruments and projects worldwide. Its 8-nm beam size, conbined with its 2-nm overlay accuracy enables patterning of dense features down to 10 nm half-pitch.
The Nanowriter is part of a much larger ecosystem of processing and metrology equipment including:
The Nanofab lab supports the processing of many common materials:
Oxford Plasmalab 1500 dual chamber ICP/RIE.
Scanning Electron Microscope (SEM).
Diffractive or holographic optical elements can play an important role in lithography systems by providing an efficient mechanism for generating modified illumination. CXRO's scientific team was the first to demonstrate and characterize an EUV binary phase-only computer-generated hologram allowing arbitrary far-field diffraction patterns to be generated. The device shown below achieved an absolute efficiency of 22% into one diffracted order.
SEM image of custom EUV phase-only holographic optical element (HOE) before multilayer deposition
SEM cross-seciton of Mo/Si multilayer coating on 2-nm-tall HOE features.
Far-field +1 order EUV diffraction pattern from the manufactured HOE.
Defects buried beneath the reflective multilayer coating can ruin EUV lithography masks. CXRO's Nanowriter is used to create customized, programmed defects for systematic defect detectability and printability studies.
SEM cross section of a programmed buried defect coated with a multilayer.
Templated block-copolymer self-assembly may be a great way to achieve dense patterned media with periods below 20 nm and with long range order over several cm. In collaboration with Seagate, the CXRO Nanowriter has been used to generate self-assembly templates for 0.5 Tb/in2 bit patterned media. Images courtesy of Kim Lee, Seagate.
SEM of 0.5 Tb/in2 pattern generation template
SEM of a servo pattern
"We believe in close interactions with our collaborators. We pride ourselves on understanding our customers' goals and finding unique solutions for the specific problem at hand. When you find yourself in need of nanofabrication expertise for your research or development project, we are here to help."
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