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Mask Development

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The SEMATECH Berkeley MET is used for the testing of mask repair methods. Masks have been repaired using E-beam etching, then used to print through-focus images in resists, demonstrating the effectiveness of the repair.

Illustration of the E-beam repair process Repaired absorber defect on mask using e-beam etch technique Image of repaired
absorber defect on
mask using e-beam
etch technique
Printed through-focus images using repaired mask

The SEMATECH Berkeley MET has also been used to verify mask shadowing models: (Select an image to view full size)

Mask shadowing images Mask shadowing comparison of MET results to simulation

References

  1. Gi-Sung Yoon et al., 2007 International EUVL Symposium, 28-31 October 2007, Sapporo, Japan
  2. Hwan-Seok Seo et al. EIPBN 2008