The Nanofabrication
Facility

The Nanowriter, the centerpiece of a veteran nanofabrication facilities. It enables the fabrication of significanly improved diffractive x-ray optics, structures for surface and materials science, quantum electronic devices, and using its unique stitching accuracy, complex mask structures for nanoelectronic lithography applications.

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The term nanofabrication refers to a key set of underlying techniques with extremely broad application across many areas of science and technology. The nanofabrication program is designed to advance the state of the art to enable the patterning of materials at nanometer length scales. The primary research thrusts are in the areas of lithography and resist and etch process development.

The expertise developed during the course of the program is being applied to many different projects:

Diffractive x-ray optics for microscopy and interferometry.
Semiconductor lithography research.
Nanomagnetism.




Highlights of Recent Publication:
  1. E.H. Anderson, "Specialized electron beam nanolithography for EUV and X-ray diffractive optics", IEEE J. Quant. Elect., 42, 27-35 (2006).

  2. W. Chao, B.D. Harteneck, J.A. Liddle, E.H. Anderson and D.T. Attwood, "Soft X-ray microscopy at a spatial resolution better than 15 nm", Nature, 435, 1211-1213 (2005).